Sputter Deposition Method for III-V Semiconductor

Abstract

The major effort in the program has been the development of a microwave source to lower the sputter plasma voltage. I originally proposed an electron gun. However, the electron gun had a fundamental flaw. It extinguished the plasma near its insertion point with a resulting non-uniform deposition.

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Document Details

Document Type
Technical Report
Publication Date
Nov 03, 2001
Accession Number
ADA396731

Entities

People

  • Curt M. Lampkin

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Accuracy
  • Body Weight
  • Electron Guns
  • Electronics
  • Electrons
  • Energy
  • Films
  • High Energy
  • Impedance
  • Low Voltage
  • Magnetic Fields
  • Materials
  • Measurement
  • Power Supplies
  • Semiconductors
  • Solar Cells
  • Thin Films

Readers

  • Computational Modeling and Simulation
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene