High Speed, High Accuracy Stage for Advanced Lithography

Abstract

This is the final report for DARPA SBIR program "High Speed, High Accuracy Stage for Advanced Lithography". The goal of this program was to explore the viability of planar encoder technology as the metrology system for next generation lithography (NGL) systems. Over the course of this program, OPTRA has developed a deep and thorough understanding of the advantages and limitations of planar encoder technology. In this report, we will document our understanding of planar encoder technology, present data that demonstrates its capability and present conclusions regarding its suitability for use in NGL systems. In addition, we will describe the NanoGage, a z-displacement sensor partially developed and commercialized under this program as a complement to the NanoGrid planar encoder.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Dec 01, 2001
Accession Number
ADA398052

Entities

People

  • Michael Hercher

Tags

Communities of Interest

  • Sensors
  • Weapons Technologies

DTIC Thesaurus Topics

  • Accuracy
  • Atmospheric Motion
  • Automatic Gain Control
  • Control Systems
  • Detectors
  • Fabrication
  • Field Programmable Gate Arrays
  • High Resolution
  • Interferometers
  • Laser Beams
  • Laser Diodes
  • Lasers
  • Lithography
  • Measurement
  • Metrology
  • Semiconductor Devices
  • Semiconductors

Readers

  • Computer Programming and Software Development.
  • Integrated Circuit Design and Technology.
  • Software Engineering