Patterned Self-Assembly in Non-Stoichiometric Semiconductors

Abstract

This Final Report covers the research on two projects: self-assembly by controlled precipitation and thin lateral oxide barrier fabrication. We obtained several important experimental findings that demonstrate the practicality of these techniques for high-throughput nanostructure fabrication. Three of our findings demonstrated experimentally the capabilities of the controlled precipitation process and the fourth increased understanding of the mechanism. We also characterized and compared oxides produced by two thin lateral oxide barrier fabrication processes.

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Document Details

Document Type
Technical Report
Publication Date
Nov 30, 2001
Accession Number
ADA398657

Entities

People

  • J. S. Harris Jr.
  • R. A. Kiehl

Organizations

  • Stanford University

Tags

DTIC Thesaurus Topics

  • Assembly
  • Barriers
  • Compound Semiconductors
  • Electron Beam Lithography
  • Fabrication
  • Films
  • High Temperature
  • Low Humidity
  • Low Temperature
  • Materials
  • Nanostructures
  • Particle Size
  • Particles
  • Precipitation
  • Self Assembly
  • Semiconductors
  • Thin Films

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Systems Analysis and Design
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene