Development of An Integrated Proximity Effect Correction Scheme

Abstract

The specific aim of this project is to develop an integrated proximity effect correction package which can handle sub-0.1 micrometers feature size, heterogeneous substrates, exploits both of dose and shape modification, and is applicable to projection or multiple electron beam lithographic systems as well as single (Gaussian) beam systems. Also, the software is to be parallelized for fast correction exploiting a readily available network of workstations. As reported in the interim progress reports and this final progress report, the proposed research project has been successfully completed.

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Document Details

Document Type
Technical Report
Publication Date
Oct 22, 2001
Accession Number
ADA398804

Entities

People

  • Soo-Young Lee

Organizations

  • Auburn University

Tags

Communities of Interest

  • Human Systems

DTIC Thesaurus Topics

  • Abstracts
  • Accuracy
  • Computer Simulations
  • Electrical Engineering
  • Electron Beam Lithography
  • Electron Beams
  • Electron Scattering
  • Electrons
  • Engineering
  • Military Research
  • Neural Networks
  • Scattering
  • Scientists
  • Simulations
  • Spatial Distribution
  • Substrates
  • Technology Transfer

Fields of Study

  • Physics

Readers

  • Computational Fluid Dynamics (CFD)
  • Electronics Engineering
  • Image Processing and Computer Vision.

Technology Areas

  • Directed Energy
  • Microelectronics