Particle Simulation of CH4/H2 RF Glow Discharges for DLC Film Deposition
Abstract
Particle-in-cell/Monte Carlo (PIC/MC) simulations of capacitively coupled radio-frequency (RF) glow discharges were carried out for low pressure CH4/H2 plasmas. The present computational scheme considers the motions and collisions of both neutral and charged particles. The CH4/H2 plasma is modeled by combining a one dimensional PIC/MC method with a polyatomic particle collision scheme. The model considers the motions of neutrals CH4, CH3, C2H5, H2, and H, positive ions (CH4+) and electrons. Space and time dependent results show that ionization rate is high at the sheath region. Deposition rate of carbon film is calculated by sampling impinging particles at the powered electrode. When CH4 flow rate is decreased and the H2 flow rate is increased, the gas density in the chamber and deposition rate decreased significantly for carbon containing radicals. On the other hand, when CH4 flow rate is fixed and H2 flow rate is increased, deposition rate again decreased, but the gas density in the chamber did not change much.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jul 09, 2000
- Accession Number
- ADA400898
Entities
People
- B. Farouk
- K. Nagayama
Organizations
- Drexel University