Reactions of Energetic Ions with Thin Film Surfaces
Abstract
The PI has designed and constructed a multi function vacuum chamber for evaporating metal films and depositing insulating layers. The chamber is to be used for fabricating metal-insulator-metal (M-I-M) devices that function as novel solid-state electron emitters. Nanoscale M-I-M devices deliver hot electrons to the metal/vacuum interface from within the solid. These hot electrons can stimulate nonthermal chemical reactions at the gas/surface interface or supplement the charge density of a plasma above the device. The chamber houses an electron analyzer for testing the devices in situ. Moreover a load-lock permits easy introduction of samples and transference to an adjoining ultrahigh vacuum (UHV) chamber so that more detailed surface analyses can be performed.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 28, 2002
- Accession Number
- ADA405890
Entities
People
- Dennis C. Jacobs
Organizations
- University of Notre Dame