Self-Assembling Nanomembranes Through Electrostatic Melt Processing of Copolymer Films

Abstract

Polystyrene-polyisobutylene-polystyrene (SIBS) block copolymer films have been electrostatically melt processed in order to induce a preferential orientation in the material microstructure. The results show that electrostatic melt processing is inducing some change in the microstructure, but full reorientation is not being achieved. The low dielectric contrast of the SIBS blocks as well as the relatively short electrostatic processing times are the likely causes of incomplete alignment.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 2002
Accession Number
ADA406016

Entities

People

  • Eric D. Wetzel
  • Frederick L Beyer

Organizations

  • United States Army Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Biomedical And Dental Materials
  • Block Copolymers
  • Copolymers
  • Dielectric Polymers
  • Electric Fields
  • Films
  • Fuel Cells
  • Geometry
  • Materials
  • Materials Laboratories
  • Materials Processing
  • Microstructure
  • Orientation (Direction)
  • Polymeric Films
  • Polymers
  • Scattering
  • X Rays

Fields of Study

  • Materials science

Readers

  • Nanocomposite Materials Science
  • Polymer Science and Technology

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Microelectronics - Microelectromechanical Systems