AlInGaN-Based Crested Quantum Tunneling Barriers for Advanced Data Storage Systems
Abstract
Semiconductor memory is one of the key elements in modern computing systems. Today, floating-gate ("lash) memory, which exhibits very long writing and erasing time, is widely used in many applications. One way to achieve dramatic speed-up of floating-gate memories by quantum-mechanical tunneling is through implementation of specially shaped ("crested") tunnel barriers. In contrast to the conventional uniform Fowler-Nordheim barriers used. in existing floating gate memories, the maximum height of the crested barrier may be strongly suppressed with even moderate changes of applied electric field. The most important step in the development of the crested barrier idea is to find suitable combinations of semiconductor materials, which would provide barriers with tunneling transparency changing by 18 orders of magnitude under a change of applied voltage by a factor of 2 to 3, in moderate electric fields.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 2002
- Accession Number
- ADA407734
Entities
People
- Jianyu Dang