Presidential Early Career Achievement Award for Dr Venkat Selvamanickam
Abstract
The objective of the program is to develop a fundamental understanding of YBCO film deposition by Metal Organic Chemical Vapor Deposition (MOCVD,) on biaxially textured metal substrates. MOCVD was chosen for several reasons. First, other than PLD only MOCVD has been shown to achieve high deposition rates in producing high quality YBCO as shown in Table I. Second, only MOCVD offers the advantage of both high deposition rate and large deposition area, which is important for high throughput. This is shown in Table II. MOCVD offers other advantages too such as not being limited to line-of-sight deposition, separation of precursors from the deposition chamber (easy refill of precursors for unlimited regeneration), ability to modify film composition during deposition, and no target fabrication expense. When this program was begun 5 years ago, MOCVD of YBCO films suffered from problems such as reproducibility and stability Also, no group had demonstrated high Jo and high Ic on biaxially-textured metal substrates. Further, no group had demonstrated high Ic and high Ic in YBCO films deposited in a moving mode. This program took upon the challenges to address to issues. The program includes a study of the a) influence of MOCVD processing conditions such as the flow rate of precursor vapors, precursor vaporization temperatures, oxygen partial pressure, reactor pressure, and the deposition temperature on the film features such as superconducting phase formation, composition, texture, deposition rates, uniformity in thickness, porosity and the presence of secondary phases, b) relationship between film microstructure and the critical current density (is), and c)influence of metal substrate and buffer layers on the growth and performance of YBCO d)development of MOCVD hardware specifically for fabrication of high quality YBCO on metal substrates.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 2002
- Accession Number
- ADA408169
Entities
People
- Venkat Selvamanickam