In-Situ Oxygen-Atom Erosion Study of a Polyhedral Oligomeric Silsesquioxane (POSS)-Siloxane Copolymer Using a Novel Hyperthermal Oxygen Atom Source and Analysis by X-Ray Photoelectron Spectroscopy

Abstract

The surface of a film of a polyhedral oligomeric silsesquioxane (POSS)-siloxane copolymer has been characterized in-situ using X-ray photoelectron spectroscopy (XPS) before and after exposure to incremental fluences of oxygen atoms produced by a novel hyperthermal oxygen atom source. The data indicate that the atomic oxygen initially attacks the cyclohexyl groups that surround the POSS cage resulting in the formation and desorption of CO(2) from the surface.

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Document Details

Document Type
Technical Report
Publication Date
Sep 08, 1999
Accession Number
ADA409463

Entities

People

  • Gar B. Hoflund
  • Rene I. Gonzalez
  • Shawn H. Phillips

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Aging (Materials)
  • Air Force Research Laboratories
  • Chemical Engineering
  • Chemical Reactions
  • Chemistry
  • Earth Orbits
  • Films
  • High Resolution
  • Low Earth Orbits
  • Macromolecules
  • Material Degradation Processes
  • Materials
  • Organic Materials
  • Polymers
  • Spacecraft
  • X Ray Photoelectron Spectroscopy
  • X Rays

Fields of Study

  • Materials science

Readers

  • Electrochemical Surface Science
  • Polymer Science and Technology
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Microelectronics