Mechanical Relaxation and Microstructure of Poly(norbornyl-POSS) Copolymers

Abstract

The mechanical relaxation behavior and microstructure of a series of novel norbornyl-POSS organic-inorganic copolymers have been investigated. Furthermore, we examined the influence of weight fraction of POSS-norbornyl monomer, as well as the potential sensitivity to the seven organic corner groups present in each POSS macromer. POSS refers to the Polyhedral Oligomeric Silsesquioxane inorganic/organic macromer, which is composed of an inorganic Si8O12 spherical core surrounded with seven inert organic corner groups and one reactive norbornyl moiety. It was observed that POSS copolymerization enhances the alpha-relaxation temperature, T sub alpha, however, the magnitude of this dependence is larger for the POSS-norbornyl comonomer possessing cyclohexyl corner groups (cyPOSS) than for the copolymer with cyclopentyl corner groups (cpPOSS).

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Document Details

Document Type
Technical Report
Publication Date
Aug 11, 1998
Accession Number
ADA409490

Entities

People

  • A. Romo-uribe
  • Hong G. Jeon
  • Joseph D Lichtenhan *
  • Patrick T. Mather
  • Timothy S. Haddad

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Air Force Research Laboratories
  • Amorphous Materials
  • Biomedical And Dental Materials
  • Chemistry
  • Copolymers
  • Glass Transition Temperature
  • Heat Of Activation
  • Materials
  • Materials Science
  • Mechanical Properties
  • Molecules
  • Polymers
  • Scattering
  • Tensile Modulus
  • Thermoplastic Resins
  • Transition Temperature
  • X Ray Scattering

Readers

  • Polymer Science and Technology

Technology Areas

  • Microelectronics