Model Polyhedral Oligomeric Silsesquioxane Thin Films for Coating Applications

Abstract

The possibility of forming Polyhedral Oligomeric Silsesquioxanes (POSS) based coatings is considered. Surfactant POSS molecules (containing hydrophilic silanol "head" groups and hydrophobic organic coronas) are spread on water in a Langmuir Blodgett apparatus and the surface pressure-area relationships are determined and correlated to the structure of the POSS surfactant. Langmuir-Blodgett transfer of surfactant POSS onto silicon substrates is considered as a model "dip coat" application; however, POSS monolayers do not appear to be sufficiently stable to undergo Langmuir Blodgett transfer. The thin film stability is discussed.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Feb 21, 2002
Accession Number
ADA410044

Entities

People

  • Alan Esker
  • Brent Viers
  • Joe Polidan
  • Shawn Phillips
  • Timothy Haddad

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Air Force Research Laboratories
  • Crystal Structure
  • Films
  • Hydrophilic Properties
  • Hydrophobic Properties
  • Langmuir Blodgett Films
  • Material Degradation Processes
  • Materials
  • Materials Laboratories
  • Materials Science
  • Monomolecular Films
  • Polymers
  • Self Assembled Monolayers
  • Thin Films
  • Three Dimensional
  • Two Dimensional

Fields of Study

  • Chemistry

Readers

  • Polymer Science and Technology
  • Thin Film Deposition Science.