Nanoimprint Lithography of Parallel Patterning of Nanoscale Magnetoelectronic Devices
Abstract
In the last 6 months, Nanonex Corp has developed technologies based on nanoimprint lithography for parallel patterning of nanoscale magnetoelectronic devices.
Document Details
- Document Type
- Technical Report
- Publication Date
- Dec 01, 2002
- Accession Number
- ADA411296
Entities
People
- Larry Koecher
- Linshu Kong