Development of a Bright Peak Enhanced X-Ray Phase Shifting Mask BPEXPM

Abstract

Under a separate DARPA grant, the Center for NanoTechnology (CNTech) had developed and patented (Yang, Lei, Taylor, J.W., and Cerrina, F., "Enhanced Bright Peak Clear Phase Shifting Mask and Methods of Use", U.S. Patent 6,428,939, August 6, 2002, application filed 03/22/01) the concept of using a clear phase X-ray mask called the Bright Peak Enhanced X-ray Phase Mask (BPEXPM) to produce reduced features on the wafer from larger features on the mask.

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Document Details

Document Type
Technical Report
Publication Date
Feb 27, 2003
Accession Number
ADA412072

Entities

People

  • Franco Cerrina
  • James W. Taylor

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Ceramic Materials
  • Contracts
  • Electronics
  • Fabrication
  • High Resolution
  • Intensity
  • Materials
  • Nanotechnology
  • Naval Aviation
  • Phase Shift
  • Radio Frequency Detectors
  • Residual Stress
  • Semiconductors
  • Standards
  • Stations
  • Storage Rings
  • X Rays

Fields of Study

  • Physics

Readers

  • Military History
  • Nanofabrication and Microfabrication.
  • Quantum Dot Semiconductor Device Photonics and Graphene Optoelectronic Materials and THz Physics.

Technology Areas

  • Biotechnology