VCSEL and Smart Pixel Research for VLSI Photonics
Abstract
The goal of this research program is to develop smart pixels and related technology for VLSI photonic systems. The native oxide and tunneling contact technology developed at the University of Illinois is the enabling technology for high performance vertical cavity surface emitting lasers (VCSELs) which will be used in future photonic systems and specifically in the smart pixels that are the focus of this research program. The smart pixel 8 x 8 (2.5 Gb/s) and 2 x 2 (20 Gb/s) arrays that will be studied will operate at 670 nm or 1330 nm and will utilize the native oxide defined VCSELs with tunnel junction contacts and heterogeneous materials integration through direct-wafer fusion, epitaxial lift-off, and bumpbonding techniques for integration and packaging. The University of Illinois and the University of Texas (20 GHz) and the Vitesse GaAs E/D MESFET/MSM technology utilizing the MOSIS foundry (2.5 GHz).
Document Details
- Document Type
- Technical Report
- Publication Date
- Feb 25, 2003
- Accession Number
- ADA413699
Entities
People
- K. Y. Cheng
- MengKe Feng
- N. Holonyak Jr.
- Russell D. Dupuis
- S. R. Forrest
Organizations
- University of Illinois Urbana–Champaign