Demonstration of ISCO Treatment of a DNAPL Source Zone at Launch Complex 34 in Cape Canaveral Air Station
Abstract
Dense, nonaqueous-phase liquid contaminants are a challenge to characterize and remediate at many sites where such contaminants have entered the aquifer due to past use of disposal practices. Chlorinated solvents are common DNPL contaminates at sites where operations, such as aircraft maintenance, dry cleaning, and metal finishing have historically occurred. In the past, because of the difficulty in identifying the DNAPL source zone, most remediation efforts focused on controlling the migration of the dissolved chlorinated volatile organic compounds plume. Recently, many sites owners have had success in locating DNAPL sources. DNAPL source remediation is beneficial because once the source has been significantly mitigated, the strength and duration of the resulting plume can potentially be lowered. The goal of the project is to evaluate the technical and cost performance of chemical oxidation technology for remediation of DNAPL source zones. This innovative technology is based on the ability of strong oxidants to react with and destroy several types of DNAPL contaminants. Treatment of chlorinated volatile organic compounds with oxidants has been used historically for drinking water and wastewater treatment, but the in situ use of these oxidants for DNAPL source treatment is relatively new. The chemical oxidation demonstration is part of a larger demonstration of three different DNAPL remediation technologies being conducted.
Document Details
- Document Type
- Technical Report
- Publication Date
- Oct 17, 2002
- Accession Number
- ADA414447
Entities
People
- Arun Gavaska
- Woong-sang Yoon
Organizations
- Battelle Memorial Institute