Silicon and Germanium Thin Film Chemical Vapor Deposition, Modeling and Control
Abstract
From 1995-2000, researchers at The University of Texas at Austin and the University of Wisconsin, Madison investigated and demonstrated new, intelligent manufacturing processes for growing epitaxial silicon alloy thin films that employ input from in situ optical process sensors to maintain precise control of film composition and thickness. The research team accomplished what was set forth in the original proposal. Significant progress was made in understanding the fundamental chemistry and physics of thin alloy films that affects the sensor operation and growth models, in developing and implementing state estimation and model predictive control techniques, in advancing optical sensors that can provide a complete description of the film properties, and in the design and demonstration of strained SiGe/Si and SiGeC/Si heterostructures with significant device performance enhancements over Si-based devices.
Document Details
- Document Type
- Technical Report
- Publication Date
- Apr 01, 2002
- Accession Number
- ADA417307
Entities
People
- John G Ekerdt
Organizations
- University of Texas at Austin