Request for Mask Aligner and Upgrade for a Reactive Ion Etcher
Abstract
A mask aligner model Suss MJB3 UV/IR Mask Aligner to support our on going research was proposed for acquisition and the proposal was approved. An upgrade package for an RIB system was also proposed. However, due to limited funds only the funds for the mask aligner was made available. Consequently, the RIB upgrade portion of the proposed activity was not implemented. The mask aligner got ordered, received, and brought on line in June 2002 rapidly. It has been in use ever since and operating smoothly. The newest addition to the lithography equipment is a Karl Suss MJB3 mask aligner. Some of the features this model garnishes are UV 300 and UV 400 exposure source and front and back side illumination. The aligner is capable of producing about 0.5 um line widths. Available front exposure and viewing, and back viewing allow alignment of the front patterns with respect to those on the back. The unit is either used by or support of research of some 25 researchers at VCU microelectronics center. A photograph of the exposure system is shown in Fig. 1.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 14, 2003
- Accession Number
- ADA417759
Entities
People
- Hadis H. Morkoç̌
Organizations
- Virginia Commonwealth University