Direct Write Laser Lithography System

Abstract

The Heidelberg Instruments laser writer was purchased in July 2002, arrived in November 2002, and was fully operational after several months of optimization and hardware troubleshooting in April 2003. At present, this instrument is used for optical beam-writing of UV lithography masks, and will be employed in tandem with a recently purchased MA6/BA6 mask aligner for rapid prototyping in nanobiotechnology and nanophotonics research at Caltech. It is presently also used for direct-writing of microfluidic replication molding dies, and has enabled the demonstration of the first integrated elastomeric one-way microfluidic valve. It has been successfully applied towards the microfabrication of electrostatic contacts onto optical devices that are back-filled with liquid crystals and electro-optic polymers with the goal of constructing electrically tuneable optical devices.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2002
Accession Number
ADA419981

Entities

People

  • Axel Scherer

Organizations

  • California Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms

DTIC Thesaurus Topics

  • Crystals
  • Demonstrations
  • Electric Fields
  • Electron Beam Lithography
  • Fabrication
  • Laser Resonators
  • Lasers
  • Liquid Crystals
  • Lithography
  • Optical Materials
  • Optical Properties
  • Optics
  • Photonic Crystals
  • Refractive Index
  • Resonators
  • Semiconductor Lasers
  • Semiconductors

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Optical Physics and Photonics.
  • Research Science/Academic Research

Technology Areas

  • Biotechnology
  • Directed Energy