Sub 50nm Critical Dimension Lithography Using Surface Plasmon Enhanced Illumination

Abstract

Surface plasmon enhanced illumination Is a photonics device that creates a nanometric source of bright propagating light. This light source serves as the basis for a direct write maskless photolithography system. The key progress made on this project is the demonstration of lateral resolution less than 50nm. The lateral resolution corresponds directly to feature size when patterning a photoresist.

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Document Details

Document Type
Technical Report
Publication Date
Apr 30, 2004
Accession Number
ADA423578

Entities

Organizations

  • Harvard Medical School

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Demonstrations
  • Diameters
  • Electron Beams
  • Electrons
  • Fabrication
  • Fast Fourier Transforms
  • Illumination
  • Images
  • Light Sources
  • Lithography
  • Materials
  • Optical Fibers
  • Optics
  • Photolithography
  • Photonics
  • Plasmons
  • Surface Plasmons

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Nanoscale Plasmonic Nanotechnology