Applications of High Tc Planar Josephson Technology

Abstract

During this grant period we have taken our established single junction process to the next step in realizing a very large scale Josephson integrated circuit technology. We have made many process level improvements to address nonuniformity issues. We have fabricated identical junction pairs to study the mutual interactions between junctions. We have also fabricated arrays of 10, 50, and 100 junctions and have demonstrated a giant Shapiro step in the 10 junction case. Lastly we have updated and improved our measurement system and capabilities.

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Document Details

Document Type
Technical Report
Publication Date
Feb 29, 2004
Accession Number
ADA424063

Entities

People

  • Robert C. Dynes

Organizations

  • University of California, San Diego

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Data Acquisition
  • Electrodes
  • Electromagnetic Fields
  • Electron Beam Lithography
  • Electron Beams
  • Fabrication
  • Films
  • Josephson Junctions
  • Lithography
  • Manufacturing
  • Materials
  • Measurement
  • Radiation
  • Resistance
  • Semiconductors
  • Superconductors
  • Test Equipment

Fields of Study

  • Physics

Readers

  • Integrated Circuit Design and Technology.
  • Superconducting Magnet Technology
  • Systems Analysis and Design