Memowire: Polycrystalline Silicon Memory Effects

Abstract

This report results from a contract tasking Swiss Federal Inst. of Tech. Lausanne as follows: The contractor will study and report on materials and device information for the polysilicon memory project. Contractor to provide materials information on how polysilicon. silicon dioxide and the polysilicon/silicon dioxide interfaces behave under temperature and electric field stresses. Specific device information to be applicable to e-beam fabricated memory devices, the specific effect under study is the nature and origin of the hysteresis effect.

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Document Details

Document Type
Technical Report
Publication Date
Feb 13, 2004
Accession Number
ADA425052

Entities

People

  • A. M. Ionescu
  • D. Bouvet
  • Serge Ecoffey

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Crystallization
  • Electron Microscopy
  • Fabrication
  • Films
  • Grain Size
  • Implantation
  • Integrated Circuits
  • Ion Implantation
  • Materials
  • Measurement
  • Microscopes
  • Oxides
  • Polycrystals
  • Resistance
  • Silicon Compounds
  • Thin Films

Readers

  • Materials Science and Engineering.
  • Nanofabrication and Microfabrication.
  • Technical Research and Report Writing.