Infrared Stark Effect Spectroscopy for Interface Characterization
Abstract
The aim of this project is to develop a technique that can be used to obtain information concerning the formation of chemical bonds, which relate to adhesion strength, at interfaces. The technique being developed is based on the application of a large electric field in the interface region of a multiplayer structure, and then using the field to Stark shift the infrared signals from the chemical bonds between the layers. Much of the work conducted over this report period was focused on improving the signal-to-noise ratio performance of the Stark shift infrared spectrometer. Significant noise sources were identified and a new interleaved operational mode of the spectrometer implemented that avoids the largest of the noise components. We also discuss the use of an epitaxially grown layer of silicon as an adhesion layer for structures consisting of a silica sol-gel film on a crystalline germanium substrate. The very thin silicon layer does not measurably affect the optical properties of these composite systems and solves the delamination problem that has limited the utility of these structures. We are now focusing on the application of the new infrared technique to polymer/metal systems and to the study of self-assembled monolayer systems with unique properties such as temperature driven phase transitions.
Document Details
- Document Type
- Technical Report
- Publication Date
- Nov 11, 2002
- Accession Number
- ADA428899
Entities
People
- Thomas M. Niemczyk
Organizations
- University of New Mexico