Ar Ion Beam Irradiation Effects on Magnetostriction of Tb-Fe Thin Film
Abstract
TbFe2 film prepared by a flash evaporation system onto Si(100) or polyamide substrate have been irradiated with different Ar ion doses at zero, 1.3x10-17 and 2.7x10-17 ions/cm2 and at 10 kV. Magnetostrictive properties of TbFe2 film with disordered structure, saturated magnetostriction and magnetostrictive susceptibility, improved by Ar ion beam irradiation due to increasing of in-plane compressive stress.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 17, 2003
- Accession Number
- ADA429679
Entities
People
- H. Uchida
- M. Takeuchi
- T. Kuji
- Y. Matsumura
Organizations
- Tokai University