Low Dimensional K(Nb, Ta)O3 Thin Film Structures
Abstract
The objective of this project is to investigate the synthesis and properties of thin film and low-dimensional dielectric thin-film structures, focusing on the K(Nb,Ta)O3 system. K(Ta,Nb)O3 is attractive for non-linear optical waveguides and tunable microwave technologies. In this reporting period, the growth and dielectric properties of several oxide materials were examined. This work included asymmetric superlattice structures that were investigated in order to determine the effects of reduced dimensionality on the ferroelectric phase transition and dielectric properties. In order to understand the growth of these structures, the controlled formation of unit cell steps on the KTaO3 substrate surface was investigated. The dielectric properties of doped and undoped K(Ta,Nb)O3 films were also studied. For undoped K(Ta,Nb)O3 films, losses as low as tan delta = 0.03 were realized. In addition, the effect of hole doping via Ti substitution was also investigated. We also investigated properties of related oxides, including CaHfO3 and TiO2 thin films.
Document Details
- Document Type
- Technical Report
- Publication Date
- Mar 15, 2005
- Accession Number
- ADA431683
Entities
People
- David P. Norton
Organizations
- University of Florida