Nonlinear Model Reduction for RTCVD
Abstract
In this paper, the authors examine alternative methods for reducing the dimensionality of nonlinear dynamical system models arising in control of rapid thermal chemical vapor deposition (RTCVD) for semiconductor manufacturing. They focus on model reduction for the ordinary differential equation model describing heat transfer to, from, and within a semiconductor wafer in the RTCVD chamber. Two model reduction approaches are studied and compared: the proper orthogonal decomposition and the method of balancing. This leads to a discussion of computational issues in the practical implementation of balancing for nonlinear systems.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 1998
- Accession Number
- ADA439829
Entities
People
- Andrew J. Newman
- P.S.Krishnaprasad
Organizations
- University of Maryland