Motion of Nanoparticles in Rarefied Gas Flows

Abstract

Solar cells have been made from hydrogenated amorphous silicon (a-Si:H) films. The films including Si nanoparticles by 3% in the volume fraction have been found to possess good properties. In order to find the method to control this volume fraction, the motion of Si nanoparticles in the rarefied flow of H2 and SiH4 is examined for a CVD (chemical vapor depositiion) reactor by use of the DSMC method.

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Document Details

Document Type
Technical Report
Publication Date
Jul 13, 2005
Accession Number
ADA446045

Entities

People

  • K. Nanbu
  • T. Otsuka

Organizations

  • Tohoku University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Absorption Coefficients
  • Abstracts
  • Cells
  • Chemical Vapor Deposition
  • Collisions
  • Diameters
  • Flow
  • Flow Fields
  • Flow Rate
  • Gas Flow
  • Gases
  • Mass Flow
  • Nanoparticles
  • Particles
  • Rarefied Gases
  • Solar Cells
  • Vapor Deposition

Readers

  • Computational Fluid Dynamics (CFD)
  • Nanocomposite Materials Science
  • Thin Film Deposition Science.

Technology Areas

  • Biotechnology