Defects and Defect Processes in GaN

Abstract

Optically detected electron paramagnetic resonance and infrared spectroscopy have been used to probe the microscopic properties of defects in GaN. Irradiation of GaN by 2.5 MeV electrons, in situ at 4.2 K, produces two ODEPR signals that have been assigned to interstitial Ga in two distinct configurations. Models for these configurations and interconversion between them are proposed. In separate experiments, the implantation of protons into GaN, in situ at 20 K, produces a new H vibrational line at 1456/cu cm. This defect has been associated with isolated H in GaN and provides clues about the structure and mobility of H.

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Document Details

Document Type
Technical Report
Publication Date
Dec 01, 2003
Accession Number
ADA446577

Entities

People

  • George D. Watkins
  • Michael Stavola

Organizations

  • Lehigh University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Band Gaps
  • Department Of Defense
  • Electron Paramagnetic Resonance
  • Electrons
  • Implantation
  • Information Operations
  • Infrared Spectroscopy
  • Magnetic Resonance
  • Materials
  • Military Research
  • Mobility
  • Optical Detection
  • Paramagnetic Resonance
  • Physical Properties
  • Resonance
  • Semiconductors
  • Spectroscopy

Fields of Study

  • Materials science

Readers

  • Materials Science and Engineering.
  • Molecular Biology and Genetics

Technology Areas

  • Microelectronics