Thiol Diffusion and the Role of Humidity in 'Dip Pen Nanolithography'

Abstract

The radii of octadecanethiol spots deposited by an atomic force microscope tip onto a gold surface were studied as a function of contact time and humidity. The deposition is well described by twodimensional diffusion from an annular source of constant concentration, with a surface diffusion coeffi- cient of 8400 nm2 s21, independent of humidity. Facile transfer is observed even after near continuous deposition for more than 24 h in a dry N2 environment, indicating that a water meniscus is not required.

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Document Details

Document Type
Technical Report
Publication Date
Mar 29, 2002
Accession Number
ADA447755

Entities

People

  • Lloyd J. Whitman
  • P. E. Sheehan

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Energy and Power Technologies
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Chemistry
  • Coefficients
  • Data Analysis
  • Data Sets
  • Diffusion
  • Diffusion Coefficient
  • Equations
  • Humidity
  • Lithography
  • Measurement
  • Military Research
  • Nanofabrication
  • Nanolithography
  • Nanotechnology
  • Physical Chemistry
  • Physical Properties
  • Self Assembled Monolayers

Readers

  • Aerosol Science/Aerosol Physics
  • Fluid Dynamics.
  • Nanoscale Plasmonic Nanotechnology