High Luminance and Efficient GaN:Eu Inorganic EL Devices for Monochromatic Display Applications
Abstract
In this paper we report GaN:Eu AC-TDEL devices with high luminance and high efficiency levels obtained through optimized phosphor growth techniques and device structure. The GaN:Eu phosphor is grown using interrupted growth epitaxy (IGE[Trademark]). An improved thick dielectric layer (TDEL) for inorganic electroluminescent (EL) display devices has been achieved through a composite high-Kappa dielectric sol-gel/powder route. The reduction in thick dielectric porosity has improved the homogeneity of the electric field applied to the phosphor layer, resulting in a steeper luminance-voltage slope with a maximum luminance of ~1,000 cd/m2. Furthermore, the reduction in porosity has also decreased the diffuse reflection of the thick dielectric, which when pigmented, exhibits a diffuse reflectivity of <2% resulting in high display contrast.
Document Details
- Document Type
- Technical Report
- Publication Date
- Sep 01, 2004
- Accession Number
- ADA448147
Entities
People
- Andrew Steckl
- Chanaka Munasinghe
Organizations
- University of Cincinnati