Oxide Films RF Applications

Abstract

TiO2 films were grown using a reactive molecular beam epitaxy system equipped with high-temperature effusion cell for Ti and ozone. The growth mode, characterized in-situ by reflection high-energy electron diffraction (RHEED), as well as the phase assemblage, structural quality, and surface morphology, characterized ex-situ by X-ray diffraction and atomic force microscopy (AFM), depended on the choice of substrate, growth temperature, and ozone flux. Films deposited on (100) surfaces of SrTiO3, (La0.27Sr0.73)(Al0.65Ta0.35)O3, and LaAlO3 grew as (001)-oriented anatase. Both RHEED and AFM indicated that smoother surfaces were observed for those grown at higher ozone fluxes.

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 2006
Accession Number
ADA450136

Entities

People

  • Marek Skowronski
  • P. Salvador

Organizations

  • Carnegie Mellon University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemistry
  • Diffraction
  • Electron Diffraction
  • Electrons
  • Epitaxial Growth
  • Films
  • High Energy
  • High Temperature
  • Materials
  • Materials Science
  • Microscopy
  • Molecular Beam Epitaxy
  • Molecular Beams
  • Oxide Films
  • Oxides
  • X Rays
  • X-Ray Diffraction

Fields of Study

  • Materials science

Readers

  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene