Polyhedral Oligomeric Silsesquioxane (POSS) Polyimides as Space-Survivable Materials
Abstract
Polyimides (PIs) such as Kapton are used extensively in spacecraft thermal blankets, solar arrays, and space inflatable structures. Atomic oxygen (AO) in low Earth orbit (LEO) causes severe degradation of Kapton. SiO2 coatings impart remarkable oxidation resistance and have been widely used to protect Kapton, yet imperfections in the SiO2 application process and micro-meteoroid/debris impact in orbit damage the SiO2 coating leading to Kapton erosion. A polyimide that is self-passivating by the formation of a silica layer upon exposure to AO has been achieved by the copolymerization of a polyhedral oligomeric silsesquioxane (POSS) diamine. The self-passivating properties have been shown by monitoring a 1 micron deep scratch in POSS-PIs after exposure to AO. During the first AO exposure and outside of the scratch, these samples eroded 5.0 microns, 0 microns, and less than 200 nm respectively. During the second AO exposure, the samples eroded an additional 5.0 microns within the scratch and outside of the scratch, 7.0 microns within the scratch and 0 microns outside of the scratch, and 200 nm within the scratch and 0 microns outside of the scratch respectively.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 01, 2006
- Accession Number
- ADA458179
Entities
People
- Amy L. Brunsvold
- Andrew J. Guenthner
- Brian J. Petteys
- Darrell Marchant
- Gregory R. Yandek
- Joe Mabry
- Michael E. Wright
- Sandra J. Tomczak
- Timothy K. Minton
- Vandana Vij
Organizations
- Air Force Research Laboratory