NiAl Bond Coats Made by a Directed Vapor Deposition Approach

Abstract

Intermetallic, nickel aluminide alloys are widely used as bond coat materials in thermal barrier coating systems applied to nickel base super alloy components. They are usually synthesized by a solid-state reaction diffusion heat treatment following the chemical vapor deposition of aluminum on the nickel rich substrate. Here, an electron beam directed vapor deposition (EB-DVD) technique is used to simultaneously evaporate nickel and aluminum and then reactively deposit NiAl bond coats that are structurally and chemically homogeneous and well bonded to the superalloy substrate. The approach utilizes individual nickel and aluminum sources placed within a rarefied helium gas jet with flow conditions that promote vapor phase intermixing. By adjusting the electron beam current applied to each elemental source, we show that the coating layer composition can be precisely controlled. Fully dense, homogeneous, -phase NiAl coating layers with a relatively sharp compositional interface with the substrate have been deposited. The extent of the substrate interdiffusion zone is controlled by the deposition conditions.

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Document Details

Document Type
Technical Report
Publication Date
Oct 01, 2004
Accession Number
ADA465600

Entities

People

  • D. D. Hass
  • H.N.G. Wadley
  • Yu Zhang

Organizations

  • University of Virginia

Tags

Communities of Interest

  • Advanced Electronics
  • Air Platforms

DTIC Thesaurus Topics

  • Barrier Coatings
  • Chemical Vapor Deposition
  • Coatings
  • Crystal Structure
  • Deposition (Materials Processing)
  • Diffraction
  • Electron Beams
  • Engineering
  • Grain Boundaries
  • Grain Size
  • Materials
  • Materials Engineering
  • Materials Processing
  • Materials Science
  • Nickel Aluminide
  • Turbines
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Surface Engineering/Surface Coating Technology.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene