Effect of Electron Detachment on the Wall Potential and Plasma Evolution in the Afterglow Stage

Abstract

It is demonstrated that detachment of electrons in the afterglow of an electronegative plasma can lead to a significant increase in negative wall potential with respect to the plasma potential. This effect can be used to modify the near-wall sheath electric field and thickness, which are important for plasma processing applications. Also in the afterglow, this effect can lead to an increase in electron density with time, and a reduction (up to total exclusion) in diffusion cooling of electrons and can thus be used to modify the electron temperature.

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Document Details

Document Type
Technical Report
Publication Date
Jun 01, 2006
Accession Number
ADA465611

Entities

People

  • A. A. Kudryavtsev
  • C. A. Dejoseph Jr.
  • E. A. Bogdanov
  • V. I. Demidov

Organizations

  • Saint Petersburg State University

Tags

DTIC Thesaurus Topics

  • Afterglows
  • Air Force
  • Air Force Facilities
  • Air Force Research Laboratories
  • Department Of Defense
  • Electric Fields
  • Electron Density
  • Electrons
  • Governments
  • Information Operations
  • Materials
  • Military Research
  • Monitoring
  • Personal Information Managers
  • Radio Frequency
  • Standards

Fields of Study

  • Physics

Readers

  • Applied Combinatorial Optimization and Logic Circuit Design.
  • Plasma Physics.

Technology Areas

  • Microelectronics