Ultrahydrophobic Fluorinated Polyhedral Oligomeric Silsesquioxanes (F-POSS) (Preprint)
Abstract
Recently, significant attention has been drawn to preparing low surface energy materials inspired by naturally evolved biological systems possessing a high degree of ultrahydrophobicity. Specifically, the lotus leaf exhibits an inherent self-cleaning mechanism resulting from micron-sized waxy nodes protruding from its surface so that water is naturally repelled removing any foreign debris. This remarkable cleansing mechanism, coined the "lotus effect," has been artificially mimicked to produce materials with pronounced ultrahydrophobicity. Notable examples include surface patterning, molecular self-assembly, deposition, and etching. However, these examples require aggressive chemical surface treatments, high temperature post-surface modification, elaborate patterning, or necessitate the need for limitedly accessible deposition equipment. For such reasons, there exists a demand to construct ultrahydrophobic materials inspired by nature that are easy to prepare on a large scale.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jan 25, 2007
- Accession Number
- ADA471127
Entities
People
- Ashwani Vij
- Brent D. Viers
- Joseph M Mabry
- Scott T Iacono
Organizations
- Air Force Research Laboratory