High-Fidelity Real Gas Model for RF Excited Plasma Flow Control

Abstract

We demonstrate the prediction capability a self consistent finite-element formulation for mitigating inert gas flow separation using rf-driven dielectric barrier discharge. Specifically, several physical and geometric parameters such as the amplitude and shape of excitation, dielectric constants, initial ionization level, and electrode shape are studied. The effect of polyphase power supply to an array of actuators has also been explored. It is found that (1) favorable ranges of frequency and electric field exist for most effective flow control, (2) the momentum transfer to the neighboring gas is cumulative for an optimum phase angle and distance between the exposed electrodes. Also streamwise momentum transfer does not keep on increasing with the number of actuators. We extend our work towards developing a multidimensional first principles theoretical model of the non-equilibrium real gas discharge. The electric force field generated by asymmetrically arranged plasma actuator We have worked in close collaboration with Dr. Datta Gaitonde (VAAC/AFRL) code and to simulate electrodynamic mitigation of three-dimensional wing stall about a symmetric airfoil. These efforts set the basis for active flow control over a vehicle forebody.

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Document Details

Document Type
Technical Report
Publication Date
Aug 10, 2007
Accession Number
ADA474248

Entities

People

  • Roy Subrata

Organizations

  • Kettering University

Tags

Communities of Interest

  • Advanced Electronics
  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Boundary Layer
  • Computational Fluid Dynamics
  • Electric Fields
  • Electron Emission
  • Electrons
  • Flow
  • Fluid Dynamics
  • Fluid Flow
  • Frequency
  • Gas Flow
  • Glow Discharges
  • Hypervelocity Flow
  • Ionization
  • Momentum Transfer
  • Reliability
  • Three Dimensional
  • Turbulent Mixing

Fields of Study

  • Physics

Readers

  • Fluid Dynamics.
  • Plasma Physics / Magnetohydrodynamics
  • Robotics and Automation.