The Structure and Dielectric Properties of Plasma-Polymerized Benzene and OFCB Thin Films (Preprint)

Abstract

Polymeric dielectric and photonic thin films can be fabricated using plasma enhanced chemical vapor deposition (PECVD), a room temperature, solvent-free and versatile technique. Many organic precursors have been deposited yielding plasma polymerized thin films with a wide range of functionalities. These films, exhibiting highly cross-linked structures, pin-hole free bulk morphologies and smooth surfaces for a variety of film thicknesses, have been targeted for optical and dielectric applications such as waveguides, AR coatings, band-gap filters for integrated optics, and high performance dielectric devices. In this work, benzene and octafluorocyclobutane (OFCB) were chosen as starting precursors for exploring the relationship between structure and dielectric properties.

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Document Details

Document Type
Technical Report
Publication Date
Sep 01, 2006
Accession Number
ADA475005

Entities

People

  • Hao Jiang
  • Jesse Enlow
  • John T. Grant
  • Kevin Wiacek
  • Kurt Eyink
  • Lianggou Hong
  • N. Venkatasubramanian
  • Sandra Fries-carr
  • Timothy J. Bunning

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Air Force Facilities
  • Air Force Research Laboratories
  • Chemical Vapor Deposition
  • Dielectric Properties
  • Films
  • Government Procurement
  • Governments
  • Information Exchange
  • Materials
  • Materials Processing
  • Materials Science
  • Military Research
  • Thin Films
  • United States
  • Vapor Deposition

Fields of Study

  • Materials science

Readers

  • Nanofabrication and Microfabrication.
  • Organic Chemistry
  • Thin Film Deposition Science.