The Effect of Atomic Oxygen on POSS-Polyimides (Preprint)

Abstract

Kapton(Registered) is ubiquitous in space-structures, yet degrades severely in Low Earth Orbit (LEO) due to reactions with atomic oxygen (AO). Polyhedral oligomeric silsesquioxane (POSS) is a cage-like structure of silicon and oxygen, surrounded by organic groups. Both main-chain (MC) and side-chain (SC) POSS-diamines have been polymerized to form POSS-Kapton-polyimides (POSS-Kapton-PIs) which have comparable resistance to AO. POSS-copolymers form an AO-resistant silica layer upon exposure to AO, which has been identified by X-Ray Photoelectron Spectroscopy (XPS). Images of space-flown MC-POSS-Kapton-PIs, physical properties of both MC-POSS-Kaptons and SC-POSS-Kaptons, and transmission electron micrographs of MC-POSS-Kaptons will be presented.

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Document Details

Document Type
Technical Report
Publication Date
May 01, 2008
Accession Number
ADA483535

Entities

People

  • Amy Brunsvold
  • Andrew J. Guenthner
  • Brian J. Petteys
  • Joseph M Mabry
  • Laura M. Mcgrath
  • Michael E. Wright
  • Sandra J. Tomczak
  • Timothy K. Minton
  • Vandana Vij

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force Research Laboratories
  • Chemistry
  • Earth Orbits
  • Electron Microscopes
  • Electron Microscopy
  • Electrons
  • Films
  • Glass Transition Temperature
  • Low Earth Orbits
  • Materials
  • Microscopes
  • Orbits
  • Physical Properties
  • Polymers
  • Transition Temperature
  • Transitions
  • X Rays

Readers

  • Mycotoxin ecology in Amazonian ecosystems.
  • Polymer Science and Technology
  • Thin Film Deposition Science.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene
  • Space