Electron Attachment to SF(6) Under Well Defined Conditions: Comparison of Statistical Modeling Results to Experiments

Abstract

Experiments were carried out using a flowing-afterglow Langmuir-probe apparatus to measure rate constants for electron attachment to SF6 and thermal detachment from SF6'. In a recent series of papers, these results were combined with new and existing data on nondissociative and dissociative attachment to SF6 and compared to statistical modeling of the various processes involved in the stabilization of the ionic products of attachment. This paper gives a summary of those findings. The major conclusions are: (a) only the ground electronic state of SF6 needs to be invoked to explain available data; (b) the electron affinity of SF6 is higher than previously thought, namely, EA(SF6 = 1.20 (+or- 0.05) eV; (c) the endothermicity of the dissociative electron attachment reaction that yields SF5" is 0.41 eV (+or- 0.05) eV at 0 K: (d) combining these two numbers gives the bond energy D0 (F SF5") = 1.61 (+or- 0.05) eV.

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Document Details

Document Type
Technical Report
Publication Date
Aug 01, 2007
Accession Number
ADA494152

Entities

People

  • Albert A Viggiano
  • Juergen Troe
  • Thomas M Miller

Organizations

  • Air Force Research Laboratory

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Communities of Interest

  • Materials and Manufacturing Processes

DTIC Thesaurus Topics

  • Air Force
  • Air Force Research Laboratories
  • Angular Momentum
  • Collisions
  • Electron Energy
  • Electronic Mail
  • Electronic States
  • Electrons
  • Energy
  • Energy Transfer
  • Equations
  • Experimental Data
  • High Pressure
  • High Temperature
  • Low Temperature
  • Measurement
  • Physical Chemistry

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