Semiconductor Quantum Dot Structures for Integrated Optic Switches

Abstract

Quantum dot structures have been produced by etching pillars in GaAs/AlGaAs multiple quantum well structures. The pillars as tall as 1?m and with diameter as small as 40nm were defined using direct write electron beam lithography in combination with inductively coupled plasma reactive ion etching. Waveguide structures containing quantum dot regions integrated with disordered MQW sections have been fabricated. These integrated waveguides have been tested in our laboratory and have shown evidence of good waveguiding characteristics. We are currently assessing their electro-optic and nonlinear properties.

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Document Details

Document Type
Technical Report
Publication Date
Dec 23, 2008
Accession Number
ADA499965

Entities

People

  • Patrick Likamwa

Organizations

  • University of Central Florida

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Chemical Vapor Deposition
  • Electron Beam Lithography
  • Electron Beams
  • Engineering
  • Etching
  • Films
  • Lasers
  • Manufacturing
  • Materials
  • Optoelectronic Devices
  • Quantum Dots
  • Quantum Wells
  • Reactive Ion Etching
  • Semiconductors
  • Students
  • Switches
  • Waveguides

Fields of Study

  • Materials science

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Optical Physics and Photonics.
  • Thin Film Deposition Science.

Technology Areas

  • Directed Energy
  • Microelectronics
  • Microelectronics - Graphene
  • Quantum Computing