Chemical Patterning of Silicon Dioxide Substrates for Selective Deposition of Gold Nanoparticles and Fabrication of Single-Electron Transistors

Abstract

We describe a novel method to pattern SiO2 surfaces with colloidal gold nanoparticles by e-beam lithography and selective nanoparticle deposition. The simple technique allows us to deposit nanoparticles in continuous straight lines, just one nanoparticle wide and many nanoparticles long. We contact the pre-positioned nanoparticles with metal leads to form Single Electron Transistors (SETs). The Coulomb blockade pattern surprisingly does not show the parasitic "random charges" at low temperatures, indicating relatively little surface contamination.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jan 14, 2008
Accession Number
ADA500442

Entities

People

  • Adriana Biasco
  • Alex Makarovski
  • Anne Lazarides
  • Gleb Finkelstein
  • Henok Mebrahtu
  • Jeremy Huang
  • Paul Huang
  • Thom Labean
  • Ulas Coskun

Organizations

  • Duke University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aqueous Solutions
  • Electrodes
  • Electron Beam Lithography
  • Electron Microscopes
  • Electrons
  • Fabrication
  • Lithography
  • Low Temperature
  • Metallic Nanoparticles
  • Military Research
  • Nanoparticles
  • Particles
  • Scanning Electron Microscopes
  • Self Assembly
  • Silicon Dioxide
  • Substrates
  • Transistors

Readers

  • Nanocomposite Materials Science
  • Quantum spin resonance or Electron Paramagnetic Resonance spectroscopy.
  • Thin Film Deposition Science.

Technology Areas

  • Biotechnology
  • Microelectronics
  • Microelectronics - Graphene