Multilayer and Functional Coatings on Carbon Nanotubes using Atomic Layer Deposition

Abstract

Atomic layer deposition ALD can be used to deposit ultra-thin and conformal films on flat substrates, high aspect ratios structures and particles. In this paper, we demonstrate that insulating, multilayered and functionalized ALD coatings can also be deposited conformally on carbon nanotubes. Multilayered coatings consisting of alternating layers of dielectric and conductive materials, such as Al2O3 and W, respectively, are deposited on conductive multi-walled carbon nanotubes. This coated carbon nanotube can function as a nanoscale coaxial cable. Thin layers of Al2O3 ALD are also used as a seed layer to functionalize nanotubes. A carbon nanotube was made highly hydrophobic using an Al2O3 ALD seed layer followed by the attachment of perfluorinated molecules.

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Document Details

Document Type
Technical Report
Publication Date
Jul 29, 2005
Accession Number
ADA507288

Entities

People

  • C. F. Herrman
  • D. S. Finch
  • F. H. Fabreguette
  • R. Geiss
  • S. M. George

Organizations

  • University of Colorado Boulder

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aspect Ratio
  • Carbon Nanotubes
  • Chemistry
  • Coatings
  • Coaxial Cables
  • Electrical Conductivity
  • Electron Microscopy
  • Engineering
  • Films
  • Fullerenes
  • Hydrophobic Properties
  • Materials
  • Materials Processing
  • Materials Science
  • Paper
  • Physical Properties
  • Thickness

Fields of Study

  • Physics

Readers

  • Nanocomposite Materials Science
  • Surface Engineering/Surface Coating Technology.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene