Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance (Preprint)

Abstract

We present differential sputter yield measurements of boron nitride due to bombardment by xenon ions. A four-grid ion optics system is used to achieve a collimated ion beam at low energy (<100 eV). A quartz crystal microbalance (QCM) is used to measure differential sputter yield profiles of condensable components from which total sputter yields can also be determined. We report total and differential sputter yields of three grades of boron nitride due to bombardment by xenon ions for ion energies in the range of 60-500 eV and ion incidence angles of 0C, 15C, 30C, and 45C from normal. Comparisons with published values are made where possible.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
May 07, 2009
Accession Number
ADA510612

Entities

People

  • A. P. Yalin
  • B. Rubin
  • J. Topper

Organizations

  • Air Force Research Laboratory

Tags

Communities of Interest

  • Air Platforms
  • Energy and Power Technologies
  • Weapons Technologies

DTIC Thesaurus Topics

  • Air Force Research Laboratories
  • Body Weight
  • Ceramic Materials
  • Electric Propulsion
  • Experimental Data
  • Hall Thrusters
  • Ion Beams
  • Ion Sources
  • Ions
  • Mass Spectrometry
  • Materials
  • Materials Science
  • Measurement
  • Microbalances
  • Quartz Crystal Microbalances
  • Thrusters
  • Vacuum Chambers

Fields of Study

  • Physics

Readers

  • Electrochemical Surface Science
  • Plasma Physics.
  • Semiconductor Device Technology