Focused Ion Beam Milling Applied in Future Tunable-Wavelength Nano-LED's Fabrication

Abstract

This is a report on the development of a technique of self-masking lithography for making high aspect-ratio nanopillars by using a volume swelling phenomenon during beam-material interactions.

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Document Details

Document Type
Technical Report
Publication Date
Jan 07, 2010
Accession Number
ADA513618

Entities

People

  • Chuan-pu Liu

Organizations

  • National Cheng Kung University

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Aspect Ratio
  • Distributed Bragg Reflectors
  • Electrical Properties
  • Electron Microscopy
  • Etching
  • Fabrication
  • Ion Beams
  • Ions
  • Lithography
  • Materials
  • Materials Science
  • Optical Properties
  • Optics
  • Photonic Crystals
  • Quantum Wells
  • Semiconductors
  • Spectra

Fields of Study

  • Physics

Readers

  • Nanoscale Plasmonic Nanotechnology
  • Pulsed Power and Plasma Physics.

Technology Areas

  • Microelectronics
  • Microelectronics - Graphene