Effects of Hydrogen Pretreatment on Physical-Vapor-Deposited Nickel Catalyst for Multi-Walled Carbon Nanotube Growth

Abstract

Physical vapor deposited nickel catalyst layers of 10, 50, 100, 200, 350, and 500 angstrom were granulated using hydrogen plasma for varying times to determine an effective carbon nanotube (CNT) growth process using microwave plasma enhanced CVD (MPECVD). Nickel was deposited via sputtering or evaporation. The catalyst granule size, density, and resulting CNTs were analyzed. Sputtered nickel of 50 angstrom with 5 minutes of hydrogen plasma pretreatment resulted in the most effective CNT growth.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Feb 17, 2010
Accession Number
ADA519169

Entities

People

  • Benjamin L. Crossley
  • Lavern A. Starman
  • Mauricio Kossler
  • Peter J. Collins
  • Ronald A. Coutu Jr.

Organizations

  • Air Force Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Air Force
  • Carbon Nanotubes
  • Catalysts
  • Field Emission
  • Films
  • Fullerenes
  • Grain Size
  • Hydrogen
  • Liquid Crystal Displays
  • Materials
  • Measurement
  • Mechanical Properties
  • Nanoparticles
  • Organic Light Emitting Diodes
  • Physical Vapor Deposition
  • Sputtering
  • Thin Films

Readers

  • Nanocomposite Materials Science
  • Thin Film Deposition Science.