Next Generation Proton Beam Writing: A Platform Technology for Nanowire Integration
Abstract
We designed a new system for proton beam writing. The key characteristics are an improvement of the system demagnification of up to 8 and 30 in x and y, respectively compared to commercially available systems. The target chamber has show to be working properly and in initial experiments 150 nm beam spot sizes have been obtained. We have shown initial test on proton-beam writing (PBW) for Ni and Au nanowire fabrication, as well as ZnO nanowire fabrication. We have improved the resist development for nano wire template fabrication through optimization of resist which yielded higher resist contrast. A new resist material, TADEP, has been investigated in combination with PBW and has shown details down to 110 nm. We have demonstrated the absence of proximity effects in PBW down to 15 nm.
Document Details
- Document Type
- Technical Report
- Publication Date
- Jun 01, 2010
- Accession Number
- ADA520995
Entities
People
- A. A. Bettiol
- C. H. Sow
- F. Watt
- Jeroen A. Van Kan
- M. B. Breese
- T. Osipowicz
Organizations
- National University of Singapore