Very Large Scale Integration of Nano-Patterned YBa2Cu3O7-delta Josephson Junctions in a Two-Dimensional Array

Abstract

Very large scale integration of Josephson junctions in a two-dimensional series-parallel array has been achieved by ion irradiating a YBa2Cu3O(7-delta) film through slits in a nano-fabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15,820 high-aspect ratio (20:1), 35-nanometer wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I(sub ck) we found a standard deviation in I(sub ck) of about 16%.

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Document Details

Document Type
Technical Report
Publication Date
Mar 26, 2010
Accession Number
ADA522059

Entities

People

  • John Clarke
  • Robert C. Dynes
  • Shane A Cybart
  • Stehen M. Wu
  • Steven M. Anton

Organizations

  • University of California, Berkeley

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Circuit Boards
  • Electrical Properties
  • Electron Beam Lithography
  • Electron Beams
  • Fabrication
  • Films
  • Josephson Junctions
  • Large Scale Integration
  • Magnetic Fields
  • Magnetometers
  • Manufacturing
  • Materials
  • Materials Science
  • Measurement
  • Transition Temperature
  • Two Dimensional
  • Very Large Scale Integration

Fields of Study

  • Physics

Readers

  • Mathematics or Statistics
  • Nanofabrication and Microfabrication.
  • Superconducting Magnet Technology

Technology Areas

  • Directed Energy
  • Directed Energy - Pulsed-Laser Deposition
  • Microelectronics
  • Microelectronics - Graphene