Comparison of Power Dependence of Microwave Surface Resistance of Unpatterned and Patterned YBCO Thin Film

Abstract

The effect of the patterning process on the nonlinearity of the microwave surface resistance RS of YBCO thin films is investigated. With the use of a sapphire dielectric resonator and a stripline resonator, the microwave RS of YBCO thin films was measured before and after the patterning process, as a function of temperature and the rf peak magnetic field in the film. The microwave loss was also modeled, assuming a J2 rf dependence of ZS(Jrf ) on current density Jrf . Experimental and modeled results show that the patterning has no observable effect on the microwave residual RS or on the power dependence of RS.

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Document Details

Document Type
Technical Report
Publication Date
Feb 01, 2008
Accession Number
ADA523464

Entities

People

  • A.c. Anderson
  • D.e. Oatee
  • G. Dresselhaus
  • Hong Xin
  • M.s. Dresselhaus
  • R.l. Slattery

Organizations

  • Massachusetts Institute of Technology

Tags

Communities of Interest

  • Advanced Electronics
  • Energy and Power Technologies

DTIC Thesaurus Topics

  • Chemical Etching
  • Current Density
  • Diameters
  • Films
  • Frequency
  • Magnetic Fields
  • Materials
  • Measurement
  • Power Levels
  • Power Measurement
  • Residuals
  • Resistance
  • Resonant Frequency
  • Resonators
  • Sapphire
  • Standards
  • Thin Films

Fields of Study

  • Physics

Readers

  • Microwave Engineering.
  • Nanofabrication and Microfabrication.
  • Thin Film Deposition Science.