Projecting Deep-Subwavelength Patterns from Diffraction-Limited Masks Using Metal-Dielectric Multilayers

Abstract

We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination.

Open PDF

Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2008
Accession Number
ADA531703

Entities

People

  • Xiang Zhang
  • Yi Xiong
  • Zhaowei Liu

Organizations

  • University of California, Berkeley

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Circular Polarization
  • Diffraction
  • Electron Beam Lithography
  • Engineering
  • Fabrication
  • Frequency
  • Lithography
  • Materials
  • Near Field
  • Photolithography
  • Plane Waves
  • Production Engineering
  • Surface Plasmons
  • Thin Films
  • Transfer Functions
  • Two Dimensional
  • Waves

Readers

  • Applied Combinatorial Optimization and Logic Circuit Design.
  • Image Processing and Computer Vision.
  • Thin Film Deposition Science.