UV-LIGA Microfabrication of 220 GHz Sheet Beam Amplifier Gratings with SU-8 Photoresists

Abstract

Microfabrication techniques have been developed using ultraviolet photolithography (UV-LIGA) with SU-8 photoresists to create advanced sheet beam amplifier circuits for the next generation of vacuum electron traveling wave amplifiers in the 210-220 GHz (G-band) frequency regime. We describe methods that have led to successfully fabricated millimeter wave circuits, including applying ultra-thick SU-8 photoresist layers on copper, copper electroforming solutions, and the challenging removal of the SU-8 photoresists. A table of experimental liquid SU-8 removal chemistries and results is also presented.

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Document Details

Document Type
Technical Report
Publication Date
Jan 01, 2010
Accession Number
ADA533174

Entities

People

  • Baruch Levush
  • Colin D. Joye
  • Jeffrey P. Calame
  • Morag Garven

Organizations

  • United States Naval Research Laboratory

Tags

Communities of Interest

  • Advanced Electronics

DTIC Thesaurus Topics

  • Acids
  • Amines
  • Amplifiers
  • Aspect Ratio
  • Chemical Reactions
  • Chemical Synthesis
  • Chemistry
  • Construction
  • Electroforming
  • Fabrication
  • Frequency
  • Grain Size
  • Manufacturing
  • Materials Processing
  • Materials Science
  • Microfabrication
  • Organic Chemistry

Fields of Study

  • Physics

Readers

  • Nanofabrication and Microfabrication.
  • Plasma Physics / Magnetohydrodynamics
  • Quantum spin resonance or Electron Paramagnetic Resonance spectroscopy.

Technology Areas

  • 5G
  • Microelectronics
  • Microelectronics - Graphene